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High- k TiOxNy based MFIS structure for next generation FeRAM applications.(MS)

Sharma, Deepak Kumar (IITMandi, 2015-05-26)

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Author
- Sharma, Deepak Kumar (1)
Subject
- Chemical Vapor Deposition (1)
- X- ray Diffraction (1)
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Date Issued
- 2015 (1)