Development of new non-chemically amplified resists for high-resolution lithography applications (PhD)
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Development of new non-chemically amplified resists for high-resolution lithography applications (PhD)
Reddy, P. Guru Prasad
URI:
http://hdl.handle.net/123456789/284
Date:
2018-07-17
Description:
A thesis submitted for the award of the degree of Doctor of Philosophy under the guidance of Dr. Pradeep C. Parameswaran (Faculty, SBS).
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