Development of new non-chemically amplified resists for high-resolution lithography applications (PhD)

dc.contributor.advisor	Dr. Pradeep C. Parameswaran
dc.contributor.author	Reddy, P. Guru Prasad
dc.date.accessioned	2020-07-09T05:32:41Z
dc.date.available	2020-07-09T05:32:41Z
dc.date.issued	2018-07-17
dc.identifier.uri	http://hdl.handle.net/123456789/284
dc.description	A thesis submitted for the award of the degree of Doctor of Philosophy under the guidance of Dr. Pradeep C. Parameswaran (Faculty, SBS).	en_US
dc.language.iso	en_US	en_US
dc.publisher	IITMandi	en_US
dc.subject	Extreme Ultraviolet Lithography Studies	en_US
dc.subject	Helium Ion Microscope	en_US
dc.title	Development of new non-chemically amplified resists for high-resolution lithography applications (PhD)	en_US
dc.type	Thesis	en_US